先进的双束微纳加工成像系统可用于纳米尺度超高分辨率成像、分析和制造。

Helios NanoLab™综合采用了 FEI 的最佳电子和离子光学系统、配件和软件，能够为尖端纳米量级研究提供强大的解决方案。对于从事纳米技术前沿研究的科学家，Helios NanoLab 能拓展研究边界，为材料研究开辟新的天地。 

借助极具价值的亚纳米 SEM 成像技术、S/TEM 超薄样本制备能力以及最精确的原型设计功能，科学家能够将 Helios NanoLab 当作理想的研究伴侣，为未来的科技进步开发创新的新材料和纳米量级器件。

代表性支撑文章：

1.     Lvkang Shen, Liang Wu, Quan Sheng, Chunrui Ma, Yong Zhang, Lu Lu, Ji Ma, Jihong Bian, Yaodong Yang, Aiping Chen, Xiaoli Lu, Ming Liu, Hong Wang, Chun-Lin Jia. "Epitaxial lift-off of centimeter-scaled spinel ferrite oxide thin films for flexible electronics". Advanced Materials, online, 2017.

2.     Yong Zhang, Lvkang Shen, Ming Liu, Xin Li, Xiaoli Lu, Lu Lu, Chunrui Ma, Caiyin You, Aiping Chen, Chuanwei Huang, Lang Chen, Marin Alexe, Chun-Lin Jia. "Flexible Quasi-Two-Dimensional CoFe₂O₄ Epitaxial Thin Films for Continuous Strain Tuning of Magnetic Properties". ACS Nano, online, 2017.

3.     Hong-Mei Jing, Guang-Liang Hu, Shao-Bo Mi, Lu Lu, Ming Liu, Shao-Dong Cheng, Sheng Cheng, Chun-Lin Jia. "Microstructure and electrical conductivity of (Y, Sr)CoO_3-δ thin films tuned by the film-growth temperature". Journal of Alloys and Compounds, 714: 181-185, 2017.

4.     Linglong Li, Lu Lu, Dawei Zhang, Ran Su, Guang Yang, Junyi Zhai, Yaodong Yang, "Direct Observation of Magnetic Field Induced Ferroelectric Domain Evolution in Self-Assembled Quasi (0-3) BiFeO₃–CoFe₂O₄ Thin Films". ACS Applied Materials &Interfaces, 8: 442–448, 2016.

5.     Ruyi Zhang, Ming Liu, Lu Lu,Shao-Bo Mi, Hong Wang, "Ultra-low temperature epitaxial growth of lithium ferrite thin films by high-pressure sputtering". Cryst Eng Comm, 17: 8256-8263, 2015.

6.     S. B. Mi, X. W. Jin, S. Cheng, M. Liu, L Lu, C. L. Jia, "Atomic structures of planar defects in 0.95(Na_0.5Bi_0.5)TiO₃–0.05BaTiO₃ lead-free piezoelectric thin films", Journal of Alloys and Compounds, 636: 183, 2015.

7.     Li Linglong, Lu Lu, Wang Zhiguang, Li Yanxi, Yao Yonggang, Zhang Dawei, Yang Guang, Yao Jianjun, Viehland Dwight, Yang Yaodong, “Anatomy of vertical heteroepitaxial interfaces reveals the memristive mechanism in Nb₂O₅-NaNbO₃ thin films”, Scientific Reports, 5: 9229, 2015.